Sensitivity and Contrast Characterization of PMMA 950K Resist Under 30 keV Focused Ga+ Ion Beam Exposure
Publication Details
Publication Year
2025
Authors
Muratov, M.
Shabelnikova, Y.
Zaitsev, S.
Nemkayeva, R.
Guseinov, N.
Source/Journal
Micromachines
Publication Type
ArticleISSN
ISSN-2072666X
SJR Percentile
33%
EID
2-s2.0-105014282392
Abstract
https://www.scopus.com/record/display.url?eid=2-s2.0-105014282392&origin=resultslist
Subject Areas
Control and Systems Engineering
Electrical and Electronic Engineering
Mechanical Engineering
ASJC Codes
2207| 2208| 2210